GaAs lenses is semi insulator, which can be used in large power continuous CO2 laser system to replace the zinc sulfide in lens or mirror forms. GaAs lenses is suitable in applications consists of toughness and durability.
In some cases, particles of dust or steel will impact the optical element surface, the hardness and strength of GaAs lenses surface makes it a good choice under such circumstance.
GaAs lenses was originally intended for use in semiconductor applications (rather than optical applications), and therefore, it is extremely important to make careful screening of materials in the manufacture of high quality GaAs lenses optical components.
GaAs lenses optical elements are subject to the restriction of crystal growth technology, the diameter is generally below 10 cm. The materials are hygroscopic and can be safely used in laboratory and field application, its chemical properties are very stable (except contact with strong acids)
When handling optics, one should always wear gloves. This is especially true when working with Gallium arsenide components, as it is a hazardous material. For your safety, please follow all proper precautions, including wearing gloves when handling these lenses and thoroughly washing your hands afterward.
This article comes from hypoptics edit released
We develop thin film optical filters and coated components for a wide variety of applications including telecommunications, spectroscopy, consumer optics, space, satellite, and astronomy. Filter types include band-pass, edge-pass, AR, anti-smudge, multiband, and other optical filters from 300nm to 10um.
This article comes from photonics edit released
Our high-performance custom lenses are used in a wide variety of applications (UV-IR). Manufactured in prototype to volume-production quantities, our high-quality cylindrical and spherical lenses are sure to make your application or product a success.
In Need of a Prototype?
Our short lead-times and dependable quality are sure to help you speed things along. Our extensive tooling inventory will reduce (and maybe eliminate) costly tooling expenses. Let us help reduce your costs while maintaining system performance with a free review of your specifications, sharing our insight into tolerances versus costs.
Companies from all industries rely on us to keep their production lines going strong. Our expertise, quality assurance program and flexible manufacturing structure ensures quality laser optics arrive at your facility on the date you require, eliminating costly down-time. We manufacture according to your delivery requirements and deliver just-in-time, thereby lowering your inventory and administrative costs.
This article comes from photonics edit released
MgO:PPLN crystal offer the wide transmission range(360-5000nm),high non-linear coefficient and non-critical walk-off angle,so MgO:PPLN OPO might generate broad tunable,high efficient laser output from near to mid IR by designing period.
The IR laser based on MgO:PPLN has many advantages,such as ultra comapct,high performance,low cost etc. Based on our company’s advanced electric field poiling technology,MgO:PPLN crystal has high quality,high conversion efficiency and its thickness could reach 2mm.
Phoebus Vision is a supplier of MgO:PPLN crystal. Our scientists and engineers are very experienced in this field. Our products are of good quality with low prices. We can also meet your custom needs at a reasonable price.
Adding 5mol% MgO to Lithium Niobate
High nonlinear coefficient
Broad-range, High conversion efficiency
High optical damage threshold
Single and multiple gratings available
Application： 1. Mid IR laser. 2.Ranging. 3.Remote sensing. 4.Atmospheric detecting. 5.Electro-optic warf
This article comes from diytrade edit released
● Fine mechanical, optical and chemical properties
● Excellent as optical, microwave isolator and HTS substrates
GGG crystal wafers is material with good optical, mechanical and thermal properties which make it promising for use in fabrication of various optical components as well as substrate material for magneto – optical films and high – temperature superconductors. It can be used for infrared optical isolator (1.3 and 1.5 um), which is made of YIG or BIG film on the Gadolinium Gallium Garnet (GGG) substrate plus birefringence parts. GGG crystal wafers is an important substrate for microwave isolators and can be used as a HTS material, for laser technology, telecommunications, electronic.
A positron emission tomography system for small animals has been designed for research purposes. Its detection modules are based on pixelated scintillator LYSO crystal arrays coupled to Hamamatsu H8500 position-sensitive photomultiplier tubes. The front-end electronics are based on nuclear instrumentation modules (NIM) and in-house built readout circuits. Peak signal digitization is performed with a commercial analogue-to-digital acquisition (DAQ) board.
The system has been characterized for spatial, timing and energy resolution, system dead time, absolute sensitivity, scatter fraction and noise equivalent count rate (NEC).
The results indicate that the detection modules are able to identify individual crystals (out of 400) with up to 8-to-1 peak-to-valley ratios with individual crystal energy resolution ranging from 7 to 15% at 511 keV. The timing resolution is 1.9 ns and the system dead time was found to be 16.8 ¿s and 42.1 ¿s for 0.5 ml and 10 ml volume sources, respectively. The measured absolute system sensitivity is 0.11% and the scatter fraction from a glass capillary inside a 2.5 cm diameter mouse phantom is 21.5%. A true NEC maximum value was not achieved with the system due to saturation of the PS-PMT output signals for activities above 0.27 mCi. Results from a Na18 F PET bone scan of a 30 g mouse are shown.
This article comes from ieeexplore edit released
- Provide the achievement of strictly linear polarization of laser radiaton
- Utilize the polarization wich occurs on reflection from a plane surface
- Rs/Tp:>99.5/95.0% for standard thin film polarizers
- Rs/Tp:>99.5/99.0% for high transmittance thin film laser polarizers
- Ts<0.2%, Rp<0.2% for ultra high transmission thin film polarizers
- Tp>98%, Ts<0.1% for thin film polarizers with high extinction ratio
- High damage threshold reaching 10 J/cm2
- Extinction ratio 200:1 (for standard, high and ultra high transmission thin film polarizers), 1000:1 (for thin film laser polarizers with high extinction ratio)
Thin Film Laser Polarizers separate the s- and p-polarization components. They are designed for use in high energy lasers. Due to high damage threshold, reaching 10 J/cm2 @ 1064 nm 8 ns, Thin Film Polarizers are used as an alternative to Glan Laser Polarizing Prisms or Cube Polarizing Beamsplitters.
Typical applications are intracavity Q-switch hold-off polarizer or extracavity attenuator for Nd:YAG lasers.
Thin Film Polarizers can be used at an > 40° angle of incidence, but polarization is most efficient and appears in a broad wavelength range at 56° AOI (Brewster angle). Typical polarization ratio Tp/Ts is 200:1.
Standard size is up to Ø50 mm (2”), while max. available dimensions are 100×200 mm. For optimal transmission a Thin Film Polarizer should be mounted in an appropriate holder for angular adjustment. For Rectangular Thin Film Polarizers, visit here.
This article comes from eksma edit released
We report to the best of our knowledge the lowest switching voltage in an electro-optically Q-switched Nd:YVO4 laser by using a 13-mm long, 14-μm-period PPLN crystal as a Pockels cell. A switching voltage as low as ∼50 V in the PPLN crystal was sufficient to hold off the lasing of the Q-switched laser at a pump power more than two times above its continuous-wave threshold. When the PPLN Q-switch was driven by a 100-V voltage at 6.5 kHz, we obtained 0.9-kW laser peak power from this 1-W diode-pumped Nd:YVO4 laser system with 13% output coupling. When the PPLN Pockels cell was cascaded with a 5-cm long, 30-μm-period PPLN crystal, we produced ∼μJ/pulse energy at 1.59 μm from optical parametric generation inside the actively Q-switched laser.
This article comes from springer edit released
Cadmium Tungstate (CdWO4) is a scintillation crystal with extremely low afterglow, good radiation resistance, high density and high Z value, low decay time also with relatively high light output.
CdWO4 scintillators was produced by using the Bridgman technique since 2011, with the maximum crystal boule size at ∅ 80 mm x 200 mm, which can be manufactured into the target sizes, besides the single crystals, we also have the capability to fabricate it into linear or 2 dimensional array used in the X ray security inspection systems.
CdWO4 scintillators is characterized by high density, high atomic number and relatively high light yield with extremely low decay time. and the afterglow of CdWO4, when subjected to x-ray irradiation, is very slow typically less than 0.1% after 3 ms, and demonstrate very good resistance. All of these features are significant and make CdWO4 a primary scintillation crystal for X ray computed Tomography(X-CT) and in security inspection.
This article comes from epic-crystal edit released
Our Germanium lenses are perfect for Mid-Infrared applications. These lenses stand up well to harsh environments and we offer the most popular sizes with Anti-Reflection Coatings. Germanium is subject to thermal runaway, meaning that the transmission decreases as temperature increases. As such, these lenses should be used at temperatures below 100°C. Germanium’s high density (5.33 g/cm3) should be considered when designing for weight-sensitive systems. The Knoop Hardness of Germanium is 780, making it ideal for IR applications requiring rugged optics.
- High Index of Refraction
- Minimal Chromatic Aberration Due to Low Dispersion
- Perfect for Rugged IR Applications
- Popular Sizes Available with AR Coating from 3-12μm
Factory Standard– Contact us for manufacturing limit or custom specifications
- Substrate Material: Ge (Germanium)
- Diameter: 5mm-350mm
- Shape: Spherical Plano-Concave, P-Convex, Concave-Convex or Aspheric
- Focal length: +/-1%
- Surface Quality: 20-10(after coating)
- Surface figure: l/4 @ 633nm
- Clear Aperture: >85% of central dimension
- Antireflection Coating: @ 3-12 um