Specifications:
1. Specifications of high light output type GOS:Tb Thin Films:
*Explanation 1: The relative light output percentages specified in the table are calculated by setting the light output of SSF-GOSTb-002 as 100%, and then calculating the percentage values of SSF-GOSTb-001 and SSF-GOSTb-003 relative to SSF-GOSTb-002
*Explanation 2: The relative light output percentages specified in the table are calculated by setting the MTF of SSF-GOSTb-002 as 100%, and then calculating the percentage values of SSF-GOSTb-001 and SSF-GOSTb-003 relative to SSF-GOSTb-002
| Code | SSF-GOSTb-001 | SSF-GOSTb-002 | SSF-GOSTb-003 | |
| Structure | Protective Layer | 6μm | 6μm | 6μm |
| Scintillation Layer | 68 (mg/cm² ±10%) | 100 (mg/cm² ±10%) | 145 (mg/cm² ±10%) | |
| Substrate | 250μm | 250μm | 188μm | |
| Total Thickness | 406μm | 464μm | 507μm | |
| Light Output | Relative Light Output (%) (*See explanation 1) | 80% | 100% | 145% |
| Light Emission Wavelength | 550nm | 550nm | 550nm | |
| MTF | MTF (2 Lp/mm) | 0.35 | 0.25 | 0.1 |
| Relative MTF (*See explanation 2) | 140% | 100% | 40% |
2. Specifications of low afterglow type GOS:Pr Thin Films:
*Explanation 3: The relative light output percentages specified in the table are calculated by setting the MTF of SSF-GOSPr-002 as 100%, and then calculating the percentage values of SSF-GOSPr-001 and SSF-GOSPr-003 relative to SSF-GOSPr-002
| Code | SSF-GOSPr-001 | SSF-GOSPr-002 | SSF-GOSPr-003 | |
| Structure | Scintillation Layer | 80 (mg/cm² ±10%) | 180 (mg/cm² ±10%) | 300 (mg/cm² ±10%) |
| Total Thickness | 430μm | 645μm | 830μm | |
| Light Output | Relative Light Output (%) (*See explanation 3) | 100% | 125% | 147% |
| Light Emission Wavelength | 512nm | 512nm | 512nm | |
| After Glow | % @10ms | 0.008 | 0.008 | 0.114 |
| % @30ms | 0.005 | 0.005 | 0.028 | |
| % @100ms | 0.002 | 0.002 | 0.006 | |
| Transparency | Not transparent | Not transparent | Not transparent | |
| Deliquescent | No | No | No |
Modules or Types:
Below are the standard GOS thin films that Shalom EO supplies. For the specifications of these modules, please check the specification tab
| Code | Type | Material of The Scintillation Layer | Total Film Thickness | Thickness of The Scintillation Layer |
| SSF-GOSTb-001 | High light output | GOS:Tb | 406μm | 68mg/cm² |
| SSF-GOSTb-002 | High light output | GOS:Tb | 464μm | 100mg/cm² |
| SSF-GOSTb-003 | High light output | GOS:Tb | 507μm | 145mg/cm² |
| SSF-GOSPr-001 | Low Afterglow | GOS:Pr | 430μm | 80mg/cm² |
| SSF-GOSPr-002 | Low Afterglow | GOS:Pr | 645μm | 180mg/cm² |
| SSF-GOSPr-003 | Low Afterglow | GOS:Pr | 830μm | 300mg/cm² |
A GOS Scintillation Thin Film is a thin sheet consisting of a scintillation layer of GOS ceramics, a PET substrate layer, and a protective PET layer on top. Gadolinium Oxysulfide (GOS) ceramic, chemical formula Gd2O2S, is an excellent scintillation material that offers high light yield, large density, and low afterglow. The GOS ceramic thin films are often used in combination with scintillation arrays made of other scintillator material (e.g. Thallium doped cesium iodide scintillator arrays) to realize dual-energy X-ray detection utilizing two distinct energy levels of X-rays, where the GOS thin films are stacked together with the scintillation arrays and filters. The GOS thin films are optimized to absorb and convert lower-energy X-rays, and the other constituent scintillator arrays are optimized to detect higher-energy X-rays.
Hangzhou Shalom EO offers a series of GOS scintillator products, including GOS scintillation crystals (terbium-activated GOS and praseodymium-activated GOS), pixelated GOS scintillation arrays, and GOS scintillator thin film, which is specified on this page.
We can provide standard and custom GOS thin films of different sizes and thicknesses tailored to meet your needs. The GOS ceramic scintillation thin films we provide can be coupled with TFT, CCD, and PD chips.
The standard GOS scintillation thin films are available in two types:
1. High light output type thin film made of GOS: Pr, this type of GOS thin film Shalom EO offers is brighter and more sensitive to the incoming radiations (i.e. produces more light per unit dose), which implies that the photodectors attached to the thin film receive more intensive light signals, leading to higher signal to noise ratio when forming the image. This high light output type GOS thin film is suitable for low dose rate X-ray imaging.
2. Low afterglow type made of GOS: Tb, this type of GOS thin films has lower afterglow, which means they produce less ghosting, which is advantageous for applications that require high speed dynamic imaging, real-time imaging, and high frame rate, such as high frame rate X-ray imaging, industrial online real-time detection, and dynamic digital radiograph.
The manufacturing technique of Shalom EO’s GOS ceramic scintillation thin films (as in the case of producing GOS: Tb thin films) is as follows:
1. Using the coprecipitation method to produce the mixed powder of Gd2O3 and Tb2O3;
2. High-temperature sulfurization sintering forms GdSO grains;
3. Add adhesives, press the material into pieces, bound the pieces together with the PET substrates;
4. Stick a protective layer onto the light-exiting surface;
5. Obtain Gd2OS2:Tb thin films, the emission peak is 550nm.
Figure 1. The diagram showing the structure of Shalom EO's GOS scintillation thin films
