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MgO Substrates

  • Twin-less crystal structure, low dielectric constant (9.65), and tiny loss at microwave band
  • Maximum Size: 50x50x30mm
  • Stocked and custom MgO substrates are available
  • Orientations:<100>,<110> and <111>
  • Surface Roughness: Ra < 0.5nm
  • Applications: Thin film growth of Ferro-magnetic, Photo-electronic, semiconductor, and high-temperature superconductor (HTSC) applications
Inquire for custom product  
Code Size Thickness Orientation Surface Finish Unit Price Delivery Cart
641-001 5x5mm 0.5mm <100> SSP Inquire 2 weeks
641-002 5x5mm 0.5mm <100> DSP Inquire 2 weeks
641-003 5x5mm 0.5mm <110> SSP Inquire 2 weeks
641-004 5x5mm 0.5mm <111> SSP Inquire 2 weeks
641-005 10x10mm 0.5mm <100> SSP Inquire 2 weeks
641-006 10x10mm 0.5mm <100> DSP Inquire 2 weeks
641-007 10x10mm 0.5mm <110> SSP Inquire 2 weeks
641-008 10x10mm 0.5mm <111> SSP Inquire 2 weeks
641-009 Φ12.7mm 0.5mm <100> SSP Inquire 2 weeks
641-010 Φ12.7mm 0.5mm <100> DSP Inquire 2 weeks
641-011 Φ25.4mm 0.5mm <100> SSP Inquire 2 weeks
641-012 Φ25.4mm 0.5mm <100> DSP Inquire 2 weeks
641-013 Φ50.8mm 0.5mm <100> SSP Inquire 2 weeks
641-014 Φ50.8mm 0.5mm <100> DSP Inquire Inquire

MgO (Magnesium Oxide Crystals), due to its low dielectric constant and minimal microwave band loss, along with the availability of large-sized wafers (up to 2 inches in diameter and larger), has emerged as a crucial industrial material for High-Temperature Superconductor (HTS) thin monocrystalline wafers. MgO serves as an exceptional single-crystal substrate catering to various thin film growth tasks including Ferro-magnetic, Photo-electronic, semiconductor, and high-temperature superconductor films. Its utility extends to III to V element research, exploring epitaxial effects on polymer crystallization, and even for depositing ferroelectric coatings on its substrates. Moreover, MgO wafers find increasing applications in Plasma Display Panel (PDP) technology.

Hangzhou Shalom EO provides both stocked standard MgO wafers and customized wafers.

Common Specifications:

Material MgO crystals Orientation <100>,<110>,<111>
Orientation Error ±0.5° Maximum Size 50x50mm
Typical Thickness 0.5mm, 1.0mm Thickness Tolerance ±0.05mm
Size Tolerance ±0.1mm Surface Finish SSP or DSP
Roughness Ra<0.5nm Cleaness and Package 1000 grade clean room, 100 grade bags

MgO Properties:

Growth Method Special Arc Melting Crystallographic Structure Cubic a = 4.13 Å
Twinning Structure Twin free Orientation <100>, <110>, <111>
Colour Colourless Transmission Range 0.2 to 8 µm
Density 3. 585 g/cm3 Melting Point 2780 +/- 20 °C
Thermal Expansion Coefficient 11.2 * 10-6 K-1 Dielectric Constant 9.65
Specific Resistivity > 1017Ohm/cm

Curves:

1)Typical X-Ray Diffraction (XRD) Curve of MgO <100> Crystals Substrates 




2) Typical Surface Roughness of MgO substrate <100> and <010> measured by Atomic Force Microscope (AFM) in 5μm x 5μm Scale









MgO Wafers 5x5x0.5mm <100> SSP

MgO Wafers 5x5x0.5mm <100> SSP

MgO Wafers 5x5x0.5mm <100> DSP

MgO Wafers 5x5x0.5mm <100> DSP

MgO Wafers Φ50.8mmx0.5mm <100> SSP

MgO Wafers Φ50.8mmx0.5mm <100> SSP